For other uses of etch or etching , see Etching disambiguation , for the history of the method, see old master prints . Image The Soldier and his Wife.jpg thumb right thumb The Soldier and his Wife. Etching ... Etching is the process of using strong acid or mordant to cut into the unprotected parts of a metal ... Rembrandt , The Virgin and Child with a Cat , 1654. Original copper etching plate above, example of the print below, with composition reversed. In pure etching, a metal usually copper, zinc or steel ... ed artiststudio.pdf ref The artist then scratches off the ground with a pointed etching needle ... an etching which exists in more than one State printmaking state . Etching has often been combined ... as The Hundred Guilder print etching c1648 by Rembrandt . Main Old master print Origin File BM engraved printing plates.jpg thumb Selection of early etched printing plates from the British Museum Etching ... the end of the 15th century little earlier than the birth of etching as a printmaking technique. The process ... was probably made in Italy, and thereafter etching soon came to challenge engraving as the most ... special skill in metalworking, etching is relatively easy to learn for an artist trained in drawing ..., France Nancy in Duchy of Lorraine Lorraine now part of France made important technical advances in etching technique. He developed the choppe, a type of etching needle with a slanting oval section at the end ... mit Korb Belange .jpg thumb right Etching by Jacques Bellange , Gardener with basket c1612 He also seems to have been responsible for an improved, harder, recipe for the etching ground, using lute ... s innovations all over Europe with the first published manual of etching, which was translated into Italian, Dutch, German and English. The 17th century was the great age of etching, with Rembrandt ... and early 20th century the Etching revival produced a host of lesser artists, but no really major figures. Etching is still widely practiced today. Variants File America a Prophecy copy a plate 01.jpg ... more details
wiktionary etchingEtching may refer to Etching , a printmaking technique in art Etching glass , a glass decoration technique Etching metal , a metal decoration technique Industrial etchingEtching microfabrication , a process in producing microelectronics Note that all of the above can be called chemical etching , though the term is mostly used for industrial etching. An etcher is most likely to mean a printmaker. An etchant sometimes mordant is any chemical used to etch, but probably refers to an industrial process. See also Etch disambiguation disambig sv Etsning ru de tzen eo Mordado es Fresado qu mico fr Gravure industrielle pt Fresagem qu mica sv Etsning kemi uk ... more details
Other uses Etching disambiguation Unreferenced date December 2009 In semiconductor technology isotropic etching is non directional removal of material from a substrate via a chemical process using an Etching microfabrication etchant substance. The etchant may be a corrosive liquid or a chemically active ionized gas, known as a Plasma physics plasma . Isotropic etching is most easily understood by comparison to anisotropic or non isotropic etching. The most important commercial application of anisotropic etching is in semiconductor chip processing, where photolithography is used to print resist lines on silicon wafer electronics wafer s. To adequately reproduce very tiny lines below 0.1 micrometer into underlying silicon and metal layers on a wafer held in the horizontal plane, the direction of etching must be vertical only. The etchant may not be permitted to spread in the horizontal plane. Isotropic etching may occur unavoidably, or it may be desirable for process reasons. DEFAULTSORT Isotropic Etching Category Semiconductors ... more details
Wet etching may refer to Industrial etchingEtching microfabrication disambig Short pages monitor This long comment was added to the page to prevent it being listed on Special Shortpages. It and the accompanying monitoring template were generated via Template Longcomment. Please do not remove the monitor template without removing the comment as well. ... more details
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions usually a plasma physics plasma of reactive gases such as fluorocarbons , oxygen , chlorine , boron trichloride sometimes with addition of nitrogen , argon , helium and other gases that dislodge portions of the material from the exposed surface. Unlike with many but not all, see isotropic etching of the wet chemical etchants used in wet etching , the dry etching process typically etches directionally or anisotropically. Explanation Dry etching is used in conjunction with photolithography photolithographic techniques to attack certain areas of a semiconductor surface in order to form recesses in material, such as contact hole s which are contacts to the underlying semiconductor substrate or via hole s which are holes that are formed to provide an interconnect path between conductive layers in the layered semiconductor device or to otherwise remove portions of semiconductor layers where predominantly vertical sides are desired. In conjunction with semiconductor manufacturing, Microelectromechanical systems micromachining and display production the removal of organic residues by oxygen plasmas is sometimes correctly described as a dry etch process. However, also the term plasma ashing may be used. Dry etching is particularly useful for materials and semiconductors which are chemically resistant and could not be wet etched, such as Silicon Carbide silicon carbide or Gallium Nitride gallium nitride . References Dry etching is currently ... etching removal of material to create a high aspect ratio structures e.g. deep via holes or capacitor trenches . The dry etching hardware design basically involve a vacuum chamber , special gas delivery system, RF waveform generator and an exhaust system. See also Plasma etcher Etching microfabrication chem stub Category Semiconductor device fabrication Category Microtechnology Category Etching ... more details
Unreferenced date December 2009 The Etching Revival is the name given by at the time, and by art historians, to the renaissance of etching as an original form of printmaking during a period of time stretching approximately from 1850 to 1930. Historical outline During the century after Rembrandt s death the techniques of etching and drypoint brought to their highest point by him gradually declined. By the late eighteenth century, with brilliant exceptions like Piranesi and Giovanni Battista Tiepolo Tiepolo , most etchings were reproductive or illustrative. However, in the 1840s and 50 s in France .... Three people were of special importance to the French Etching Revival the publisher Cadart , the printer Auguste Delatre and Maxime Lalanne , an etcher who wrote a popular textbook of etching in 1866. A Treatise on Etching by Lalanne was translated by S.R. Koehler and published in the United States in 1880. It played a significant role in the Etching Revival in America. However, before the translation of Lalanne s book, Philip Gilbert Hamerton had become an enthiusiastic promoter of etching in Britain. His Etching and Etchers 1868 was more an art history than a technical text but it did ... by James MacNeill Whistler , c.1889 For Hamerton and others, the father of the British Etching Revival ... stands as one the highpoints of etching history. Haden was a collector and authority on the etchings .... This linking of the art of the two countries, though short lived, did much to validate etching as an art form. Very soon, French etching would show the same modernist signs that French art showed generally, while English and American etching remained true to the kind of technical proficiency and subject ... of the century, and the New York Etching Club was formed as the primary professional etching ... States. Fall in popularity Etching as a collected and therefore as a practised art appears ... century art. DEFAULTSORT Etching Revival Category Printmaking Category Modern art Category Art ... more details
Mergefrom Etch techniques date May 2011 Other uses Etching disambiguation Image Etched in Ferric Chloride at Home.jpg right thumb Etched in ferric chloride for Printed circuit board PCB production at home Unreferenced date November 2008 In industry , etching , also known as chemical milling , is the process of using acid s, Base chemistry base s or other chemical s to dissolve unwanted materials such as metal s, semiconductor materials or glass. This process has been used on a wide variety of metals with depths of metal removal as large as 12mm 0.5 in . Selective attack by the chemical reagent on different areas of the workpiece surfaces is controlled by removable layers of material called masking or by partial immersion in the reagent. It has applications in the printed circuit board ... Wet etching Residual stresses in the part are removed prior to the machining process to prevent ... material is applied to the surfaces of the part to prevent etching from taking place on these surfaces ..., polyethylene, and polystyrene . Masking which covers areas of desired etching can be removed by utilizing ... is removed and the parts are washed thoroughly to prevent further etching by residual reagent. The etched part can be further machined by other finishing operations. Photochemical etching Main Photochemical machining This process is very similar to wet etching except that a photoresist is used instead ... Spring Steel Zinc Monel PH15 7 PH17 7 Alloy 42 Kovar Etching in the semiconductor industry Main Etching microfabrication Etching is used widely to manufacture integrated circuit s and Microelectromechanical ... commonly uses plasma etching . See also Etching , for printmaking and related uses Electroetching Photochemical milling , for similar photochemical etching processes External links Commons category Etchings http www.precisionmicro.com 6 processes photo etching Photo Etching process video References references DEFAULTSORT Industrial Etching Category Etching de tzen es Fresado qu mico eo Mordado ... more details
VIN etching is a countermeasure to motor vehicle theft . It most commonly involves the use of a stencil and an acidic etching paste to engrave a vehicle s vehicle identification number VIN onto the windshield and windows. Most parts on a vehicle already have at least a partial VIN stamped onto them, and many auto parts buyers will not purchase parts that carry identification numbers. Should a thief try to sell the parts from a vehicle for profit, those marked parts carry a higher risk for both the thief and the auto parts seller. Since automotive glass generally have no identification numbers, and are often interchangeable between many different years and models of vehicle, there is usually a much ..., thus reducing or eliminating their profit. ref http culpepersheriffsoffice.com programs vin etching Culpeper County Sheriff s Office VIN Etching ref VIN etching can also increase the odds of recovery ... VIN Etching Program, retrieved May 4, 2010 ref VIN etching is recommended by police and insurance ... content refresh attachments VIN Etching Fact Sheet.pdf Allstate Insurance VIN Etching Fact Sheet ref ref http www.nbcsandiego.com news local VIN Etching Can Deter Thieves.html NBC San Diego VIN Etching ... web last Smith first Dylan title Police Free VIN etching can deter thieves url http www.tucsonsentinel.com local report 120111 vin etching police free vin etching can deter car thieves work Tucson Sentinel ... accessdate 9 January 2012 ref Some automobile dealers try to include VIN etching as an extra service ... print a charge for VIN etching on the bill of sale, as if to suggest that VIN etching is mandatory ... 9 January 2012 ref Inflated dealership fees of 200 or 300 for VIN etching are not unheard of. ref ... require that dealers offer VIN etching, no states require that consumers purchase it from the dealer ... on their car windows but are unable to find a free etching service in their area can often save hundreds of dollars over the dealership fee by using a do it yourself VIN etching kit purchased from ... more details
The Etching Club was an artists society founded in London , England in 1838 by Charles West Cope . The club published illustrated editions of works by authors such as Oliver Goldsmith , Shakespeare , John Milton and Thomas Gray . It effectively ceased to exist in 1878. ref Lang, p. 39. ref Membership colbegin Charles West Cope 1811 1890 William Holman Hunt Richard Redgrave 1804 1888 Samuel Palmer Thomas Creswick John Frederick Tayler 1806 1889 Henry James Townsend 1810 1890 John Callcott Horsley Thomas Webster painter Thomas Webster Frank Stone Samuel Palmer James Clarke Hook Richard Ansdell William Edward Frost George B. O Neill William Henry Hunt painter William Henry Hunt John Everett Millais Francis Seymour Haden Thomas Oldham Barlow colend Publications of The Etching Club Oliver Goldsmith . http www.archive.org details desertedvillage00golduoft The Deserted Village Joseph Cundall, 1855 first pub. 1841 . Oliver Goldsmith . The Vicar of Wakefield . Corney, B. Oliver Goldsmith Goldsmith s poetical works 1845 . William Shakespeare . Songs of Shakespeare 1843 . William Shakespeare . The Ballads of Shakespeare 1852 . John Milton . L Allegro and Il ponseroso 1849 . Thomas Gray . http books.google.com books?id 0C8BAAAAQAAJ&printsec frontcover&dq 22The etching club 22&lr &as brr 3&cd 26 v onepage&q&f false Elegy written in a country churchyard 1847 . The Etching Club. Etched thoughts 1844 The Etching Club. Etchings For The Art Union Of London by The Etching Club London Art Union of London, 1857 . The Etching Club. A selection of etchings by the etchings club Joseph Cundall, 1865 . References & Bibliography reflist Cope, H. W. http www.archive.org details reminiscencesofc00copeiala Reminiscences of Charles West Cope, R. A. London Bentley, 1891 p. 35 ff. Ray, Gordon Norton. The Illustrator ... of Illinois Press, 2001 p. 37 ff. Fredericksen, A. The Etching Club of London a taste for painters ... file& IXFILE templates full person.html&person 14559 The Etching Club . DEFAULTSORT Etching ... more details
Image Wet etching tanks at LAAS 0465.jpg thumb 250px Etching tanks used to perform Piranha solution Piranha ... of systems LAAS technological facility in Toulouse, France Etching is used in microfabrication to chemically remove layers from the surface of a wafer electronics wafer during manufacturing. Etching is a critically important process module, and every wafer undergoes many etching steps before ... which resists etching. In some cases, the masking material is a photoresist which has been patterned ... may be controlled approximately using the etching time and the known etch rate. More often, though, etching must entirely remove the top layer of a multilayer structure, without damaging the underlying or masking layers. The etching system s ability to do this depends on the ratio of etch rates in the two ... anisotropic etch produces vertical sidewalls. Etching media and technology The two fundamental types ... varieties. Wet etching The first etching processes used liquid phase wet etchants. The wafer .... Wet etchants are usually isotropic, which leads to large bias when etching thick films. They also ... of the art processes. However, the photographic developer used for photoresist resembles wet etching ... after wafer backgrinding , and very sensitive to thermal or mechanical stress. Etching a thin layer ... having dramatically increased strength and flexibility without breaking. Anisotropic wet etching Orientation dependent etching File Anisotropic wet etching.svg thumb An anisotropic wet etch on a silicon ... between 100 and 111 planes in silicon. Etching a 100 silicon surface through a rectangular hole in a masking ... of the wafer of math tan 1 sqrt 2 54.7 circ math If the etching is continued to completion ... Agent System for Etching Silicon journal Journal of the Electrochemical Society volume 114 year ... 3 sub N sub 4 sub , SiO sub 2 sub Plasma etching Image Photolithography etching process.svg thumb 140px Simplified illustration of dry etching using positive photoresist during a photolithography process ... more details
File Fat removal using cannula during tumescent liposuction.jpg thumb Fat removal using cannula Abdominal etching , or Ab etching , is a plastic surgery procedure invented by plastic surgeon Henry A. Mentz, III in the early 1990s that uses a special cannula to contour and shape abdominal fat pad to provide patients with a flatter stomach . The procedure selectively removes a small amount of fat around the patient s natural muscular contours and shapes or sculpts the abdomen to create a more athletic contour. ref http grande.nal.usda.gov ibids index.php?mode2 detail&origin ibids references&therow 549218 USDA Government Journal Reference ref Prior to the procedure, the surgeon makes detailed markings of the patient s flexed ab muscle s and uses the markings to remove fat and highlight the patient s individual muscular structure. The procedure is suitable for patients who are already in shape and who have between one to two centimeters of pinchable belly fat . It is not suitable for patients with larger accumulations of abdominal fat seeking to significantly reduce their belly size or accomplish weight reductions as the amount of fat removed is fairly small. A traditional liposuction is more suitable for those patients. ref Jacob Goldstein, http online.wsj.com article SB119431190803983349.html Six pack surgery From puffy to buff , Wall Street Journal , October 30, 2007 ref References div class references small reflist div External links http grande.nal.usda.gov ibids index.php?mode2 detail&origin ibids references&therow 549218 USDA Journal reference http www400.sos.louisiana.gov cgibin?rqstyp crpdtltsC&rqsdta 589485 Abdominal etching government trademark reference Category Plastic surgery Category Surgical procedures ... more details
Refimprove date December 2008 Plasma etching is a form of plasma processing used to fabricate integrated circuit s. It involves a high speed stream of glow discharge Plasma physics plasma of an appropriate gas mixture being shot in pulses at a sample. The plasma source, known as etch species, can be either charged ion s or neutral atom s and Radical chemistry radicals . During the process, the plasma will generate volatile etch products at room temperature from the chemical reaction s between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target. ref cite web url http www.oxinst.com products etching deposition growth processes techniques plasma etch Pages plasma etch.aspx title Plasma Etch Plasma Etching accessdate 2010 02 04 ref Plasma generation Plasma systems Ionization ionize a variety of source gases in a vacuum system by using RF excitations. The frequency of operation of the RF power source is frequently 13.56 MHz, chosen by the Federal Communications Commission FCC for industrial and scientific use Citation needed date September 2011 . Nevertheless, it can be used at lower frequencies kilohertz or higher microwave . The mode of operation of the plasma system will change if the operating pressure changes. Also, it is different for different structures of the reaction chamber. In the simple case, the electrode structure is symmetrical, and the sample is placed upon the grounded electrode. Free radicals such as fluorine or chlorine are created in the plasma and react at the sample surface. Without the assistance of the plasma, much higher temperature would be required. The low processing temperature is possible because the plasma generates atom s, Radical chemistry molecular ... which the species are created. The key to developing successful complex etching processes is to find ... more details
Unreferenced date December 2009 The New York Etching Club was the first professional organization in America devoted to the medium of etching . Its founders were inspired by the Etching revival that had blossomed in France and England in the middle 19th century. The purpose of the club was to create and promote etchings that did not merely reproduce existing paintings, but were original creations of art in their own right. The first meeting of the New York Etching Club took place in the studio of James David Smillie on May 2, 1877. An etching by Robert Swain Gifford was printed on a small press under the supervision of Dr. Leroy Milton Yale . Eventually, bi monthly meetings moved to the studio of Henry Farrer where etchings were printed from a press that Farrer built. Other important members of the New York Etching Club included Charles Adams Platt , Thomas Moran , Mary Nimmo Moran , Samuel Colman , Kruseman Van Elten , William Merritt Chase , Frederick Stuart Church , Stephen Parrish , Joseph Pennell , and Thomas Waterman Wood . For most members, etching was an important side interest to their main occupation as painters. The New York Etching Club held regular exhibitions through the early 1890s in which members and invited guests displayed their etchings for sale to the general public. From 1879 to 1881, works by members of the New York Etching Club were also featured in a periodical called The American Art Review . Published under the leadership of Sylvester Rosa Koehler , the first curator of prints at the Museum of Fine Arts, Boston , it further popularized etching as a medium and the New York Etching Club as a professional organization. The success of the New York Etching Club helped spawn similar organizations in other major American cities in the late 19th century. Category Etching Category Organizations based in the United States ... more details
context date December 2011 image PDMS etching scheeme.jpg 200px right thumb Figure 1 Example of a procedure using ammonium fluoride as an etchant and polymer brush polymer brushes for visualisation Patterning by Etching at the nanoscale PENs is a soft lithography soft lithographic technique in which the bonds in the polydimethylsiloxane PDMS matrix are broken to controlably etch PDMS ie dissolve at a slow rate along the outside of a PDMS channel formed with a patterned PDMS stamp applied to a surface. The channel in the stamp can be enlarged in the order of tens of nanometers to several micrometre s. Exposing a fresh area of a surface that can be reacted with. Summary PDMS contains polymer chains of silicon oxygen bonds, these bonds can be broken by fluoride containing species, in the same way that wafer electronics silicon wafers are prepared by etching with hydrofluoric acid , ammonium fluoride and related compounds. By placing a PDMS stamp that contains a channel that can be externally filled on to a surface, that surface can be functionalised in the area of the channel. By then running an etching solution through the channel, part of the PDMS will be removed. Exposing a fresh area of the surface. This can then be functionaliesd by appropriate chemistry. The width of feature produced is controlled by etchant and time. To apply this technique for the production of small patterned features it is necessary that the surface can be reacted to passivate it in the area exposed by the channel, followed by etching and then reacted in away that will only occur in the newly exposed area. References Perring M., Mitchell, M., Kenis P. J. A., Bowden N. B., Chem. Mat 2007 19 11 , 2903 Category Nanoelectronics ... more details
File Reactive Ion Etcher.JPG thumb A commercial reactive ion etching setup in a cleanroom Reactive ion etching RIE is an etching microfabrication etching technology used in microfabrication . It uses chemical reaction chemically reactive plasma physics plasma to remove material deposited on wafer electronics wafer s. The plasma is generated under low pressure vacuum by an electromagnetic field . High energy ion s from the plasma attack the wafer surface and react with it. Equipment A typical parallel plate RIE system consists of a cylindrical vacuum chamber, with a wafer electronics wafer platter situated in the bottom portion of the chamber. The wafer platter is electrically isolated from the rest of the chamber, which is usually ground electricity ground ed. Gas enters through small inlets in the top of the chamber, and exits to the vacuum pump system through the bottom. The types and amount of gas used vary depending upon the etch process for instance, sulfur hexafluoride is commonly used for etching silicon . Gas pressure is typically maintained in a range between a few milli torr and a few hundred millitorr by adjusting gas flow rates and or adjusting an exhaust orifice. Other types of RIE systems exist, including inductively coupled plasma ICP RIE. In this type of system, the plasma is generated with an RF powered magnetic field. Very high plasma densities can be achieved, though etch profiles tend to be more isotropic. A combination of parallel plate and inductively coupled ..., reactive ion etching can produce very anisotropic etch profiles, which contrast with the typically isotropic profiles of Wet etching wet chemical etching . Etch conditions in an RIE system depend strongly ... of RIE is deep reactive ion etching , used to excavate deep features. See also Deep reactive ion etching ... BYU Cleanroom RIE Etching http www.oxfordplasma.de process sibo 1.htm Bosch Process http www.clarycon.com ... processing Category Semiconductor device fabrication Category Etching microfabrication de Plasma tzen ... more details
Refimprove date December 2009 Deep reactive ion etching DRIE is a highly anisotropic etching microfab etch process used to create deep penetration, steep sided holes and trenches in wafer semiconductor wafer s substrates, typically with high aspect ratio image aspect ratio s . It was developed for microelectromechanical systems MEMS , which require these features, but is also used to excavate trenches for high density capacitor s for dynamic random access memory DRAM and more recently for creating through wafer via s Through silicon via TSV s in advanced 3D wafer level packaging technology . There are two main technologies for high rate DRIE cryogenic and Bosch, although the Bosch process is the only recognised production technique. Both Bosch and cryo processes can fabricate 90 truly vertical walls, but often the walls are slightly tapered, e.g. 88 or 92 retrograde . Another mechanism is sidewall passivation SiO sub x sub F sub y sub functional group s which originate from sulphur hexafluoride and oxygen etch gases condensate on the sidewalls, and protect them from lateral etching. As a combination of these processes deep vertical structures can be made. Cryogenic process In cryogenic ... that produces isotropic etching. However, ion s continue to bombard upward facing surfaces and etch ... Bosch process patent application ref also known as pulsed or time multiplexed etching, alternates ... from further chemical attack and prevents further etching. However, during the etching phase, the directional ... materials for truly deep etching. Polysilicon and nickel are used for 10 50 m etched depths. In DRIE of polymers, Bosch process with alternating steps of SF sub 6 sub etching and C sub 4 sub F ... deep reactive ion etching Nanotechnology, 2009 . References references See also Reactive ion etching Microelectromechanical systems Bosch DEFAULTSORT Deep Reactive Ion Etching Category Semiconductor device fabrication Category Microtechnology Category Etching microfabrication de Reaktives ... more details
Refimprove date January 2009 Electroetching is a metal etching process ref cite journal last Behr first Marion last2 Behr first2 Omri title Environmentally safe Etching journal Chem Tech volume 21 issue 4 pages 210 year 1991 ref that involves the use of a solution of an electrolyte , an anode and a cathode . The metal piece to be etched is connected to the positive pole of a source of Direct current direct electric current . A piece of the same metal is connected to the negative pole of the direct current source and is called the cathode. In order to reduce unwanted electro chemical effects, the anode and the cathode should be of the same metal. Similarly the cation of the electrolyte should be of the same metal as well. When the current source is turned on, the metal of the anode is dissolved and converted into the same cation as in the electrolyte and at the same time an equal amount of the cation in the solution is converted into metal and deposited on the cathode. Depending on the voltage used and the concentration of the electrolyte, other, more complex electrochemical effects can take place at the anode and the cathode but the solution at the anode and deposition at the cathode are the main effects. See also Etching Non toxic etchingEtching glass Glass etching Industrial etching Notes reflist External links http link.aip.org link ?JESOAN 123 703 1 Electroetching of Platinum in the Titanium Platinum Gold Metallization on Silicon Integrated Circuits Category Etching de Elektro tzen ... more details
File Goya Guerra 77 .jpg thumb May the rope break is an 1815 etching produced by Spanish painter Francisco Goya . It is one of the The Disasters of War Disasters of War series. Goya printmaking stub Category Francisco Goya paintings ... more details
A plasma etcher , or etching tool, is a tool used in the production of semiconductor devices. Plasma etcher produces a Plasma physics plasma from a process gas, typically oxygen or a fluorine bearing gas, using a high frequency electric field, typically 13.56 MHz. A silicon wafer is placed in the plasma etcher, and the air is evacuated from the process chamber using a system of vacuum pumps. Then a process gas is introduced at low pressure, and is excited into a plasma through dielectric breakdown. Uses Plasma can be used to grow a silicon dioxide film on a silicon wafer using an oxygen plasma , or can be used to remove silicon dioxide by using a fluorine bearing gas. When used in conjunction with photolithography , silicon dioxide can be selectively applied or removed to trace paths for circuits. For the formation of integrated circuits it is necessary to structure various layers. This can be done by a plasma etcher. Before etching, a photo resist is deposited on the surface, illuminated through a mask, and developed. The dry etch is then performed so that structured etching is achieved. After the process, the remaining photo resist has to be removed. This is also done in a special plasma etcher, called an Asher. Dry etching allows a reproducible, uniform etching of all materials used in silicon and III V semiconductor technology. Plasma etchers are also used for delayering integrated circuits in failure analysis References Category Semiconductor device fabrication Category Plasma processing ar ... more details
Nital is a solution of alcohol and nitric acid commonly used for routine industrial etchingetching of metals . It is especially suitable for revealing the microstructure of carbon steel s. The alcohol can be methanol , ethanol or methylated spirit s. Mixtures of ethanol and nitric acid are potentially explosive. This commonly occurs by gas evolution, although ethyl nitrate can also be formed. Methanol is not liable to explosion but it is toxic. A solution of ethanol and nitric acid will become explosive if the concentration of nitric acid reaches over 10 by weight . Solutions above 5 should not be stored in closed containers. Nitric acid will continue to act as an oxidant in dilute and cold conditions. External links http news.bbc.co.uk 1 hi england bristol 7330656.stm BBC News College fined after acid shower http www.ab.ust.hk sepo tips ls ls005.htm Explosive Nitric Acid Ethanol Mixture Category Etching es Nital no Nital pl Nital ... more details
Unreferenced date November 2009 Printmaking societies also known as printmaking clubs were prolific in 19th century United States . Their origin, however, began in Europe in the 18th century. Their impetus was primarily exhibition, technical exchange, and the promotion of etching and printmaking as a Fine arts fine art , as opposed to a method of reproducing images. The invention of photography meant that reproduction of art works could be achieved photographically instead of through the graphic arts of etching , engraving , and lithography . Thus these methods of printmaking were freed from their reproducing role to develop as pure fine arts. In addition to the rise of printmaking societies clubs, individual printmaking artists also sought to distinguish their work as a fine art, as opposed to a craft. Generally these artists from the 19th century were referred to as painter etchers. See also American print clubs California Society of Printmakers References Reflist Category Etching Category Printmaking ... more details
File Palms , etching by Amelia R. Coats, c. 1920s.jpg thumb right 300px Palms , etching by Amelia R. Coats, c. 1920s Amelia R. Coats was an American printmaker known for her small, detailed etching s. Little is known about this artist, ref name Severson, p. 142 Severson, p. 142 ref but her works are believed to date from the first quarter of the twentieth century. ref name Severson, p. 142 They consist primarily of Hawaiian landscapes featuring idyllic settings. They are typically undated and without information about the size of the edition. References Severson, Don R., Finding Paradise, Island Art in Private Collections , University of Hawaii Press, 2002, 142 3. Footnotes reflist Persondata Metadata see Wikipedia Persondata . NAME Coats, Amelia R. ALTERNATIVE NAMES SHORT DESCRIPTION DATE OF BIRTH PLACE OF BIRTH DATE OF DEATH PLACE OF DEATH DEFAULTSORT Coats, Amelia R. Category Hawaii artists Category American etchers Category American women artists Category Year of death missing ... more details
RIE may refer to Reactive ion etching , as an acronym Rie , a Japanese given name The Royal Infirmary of Edinburgh , the oldest voluntary hospital in Edinburgh, United Kingdom Resources for Infant Education , as an acronym disambig Long comment to avoid being listed on short pages fr RIE ko it RIE ... more details
A hardmask is a material used in semiconductor processing as an etch mask in lieu of polymer or other organic soft resist materials. The idea is that polymers tend to be etched easily by oxygen , fluorine , chlorine or other reactive gases to the extent that a pattern defined using polymeric mask is rapidly degraded during plasma etching . material stub Category Semiconductor device fabrication ... more details
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